UV Lamp exposure system
Find the perfect exposure system for your photolithography process
The BlackHole Lab UV Lamp exposure selection
We gather here different models of UV Lamp dedicated to microfabrication process. The UV lamp is used to expose photoresist, which is a photosensitive chemical, to imprint a microfluidic design in order to create a mold for chip replication or microfluidic chip itself. Several equipments that are different from price to functions exist but you will find here our selection of plug and play equipments working outside a clean room.
The UVK3 is the one included in our basic pack of equipment but all of these UV lamps can be included in our microfabrication station, we will advise you the best one for your application.
UVK3
Complete automatic exposure system with a highly collimated UVlight. Allowing mask exposure of wafer up to 4 inches for a high resolution.
UVK9
Complete automatic exposure system with a highly collimated UVlight. Allowing mask exposure with alignement of wafer up to 4 inches for a high resolution.
UVW25
UVled exposure system used as much for full layer exposure than photomasking applications. Basic functions for an easy use.
UVSP
Maskless mercury exposure system using beamer technology to directly write your design from your computer to your photoresist layer.
